Selective area growth of GaN using tungsten mask by metalorganic vapor phase epitaxy

被引:36
作者
Kawaguchi, Y
Nambu, S
Sone, H
Shibata, T
Matsushima, H
Yamaguchi, M
Miyake, H
Hiramatsu, K
Sawaki, N
机构
[1] Nagoya Univ, Sch Engn, Dept Elect, Chikusa Ku, Aichi 4648603, Japan
[2] Mie Univ, Fac Engn, Dept Elect & Elect Engn, Tsu, Mie 5148507, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1998年 / 37卷 / 7B期
关键词
GaN; selective area growth (SAG); tungsten (W) mask; stripe pattern; metalorganic vapor phase epitaxy (MOVPE);
D O I
10.1143/JJAP.37.L845
中图分类号
O59 [应用物理学];
学科分类号
摘要
We studied selective area growth (SAG) of GaN using a tungsten (W) mask with an atmospheric metalorganic vapor phase epitaxy (MOVPE) system. No GaN polycrystals were observed on the W mask regions, and the selectivity of GaN growth on window regions proved to be excellent. The GaN stripes developed into different shapes depending on the direction of stripe mask patterns. If the stripe was along [11 (2) over bar 0], a triangular shape with {1 (1) over bar 01} facets was formed. If the stripe was along [1 (1) over bar 00], a trapezoidal shape with a smooth (0001) surface on top and rough surfaces on both sides was obtained. The lateral overgrowth of GaN on the W mask occurred in both cases. The growth mechanisms and the facet formation were similar to those found in SAG using a SiO2 mask.
引用
收藏
页码:L845 / L848
页数:4
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