Surface morphology and electronic properties of dislocations in AlGaN/GaN heterostructures

被引:17
作者
Hsu, JWP
Manfra, MJ
Lang, DV
Baldwin, KW
Pfeiffer, LN
Molnar, RJ
机构
[1] Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
[2] MIT, Lincoln Lab, Lexington, MA 02420 USA
关键词
AlGaN/GaN heterostructures; dislocations; surface morphology; surface contact potential;
D O I
10.1007/s11664-001-0002-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Scanning force microscopy was used to examine the surfaces of AlGaN/GaN heterostructures grown by molecular beam epitaxy (MBE) on GaN templates prepared by hydride vapor phase epitaxy (HVPE) Away from dislocations, the MBE growth replicates the surface morphology of the HVPE film, with monolayer steps clearly visible in topographic images. However, the surface morphology near dislocations depends strongly on the MBE growth conditions. Under Ga rich growth the dislocations appear as hillocks, while under stoichiometric growth they appear as pits. A dependence on Al concentration is also observed. Surface contact potential variation near dislocations is consistent with excess negative charges surrounding by a depletion region, but this was observed only for the film grown under stoichiometric conditions.
引用
收藏
页码:110 / 114
页数:5
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