X-ray photoelectron spectroscopy and micro-Raman analysis of conductive RuO2 thin films

被引:103
作者
Bhaskar, S [1 ]
Dobal, PS [1 ]
Majumder, SB [1 ]
Katiyar, RS [1 ]
机构
[1] Univ Puerto Rico, Dept Phys, San Juan, PR 00931 USA
关键词
D O I
10.1063/1.1337588
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ruthenium oxide (RuO2) was synthesized in thin film and powder forms using the solution chemistry technique. The oxide electrodes on Si substrates were characterized in terms of their structure, composition, stoichiometry, and conductivity. X-ray lattice parameter calculations and micro-Raman analysis revealed the rutile structure in the material. Both films and powders exhibited an unassigned Raman band at about 477 cm(-1) in their Raman spectra. Performing peak frequency calculations for B-2g and A(1g) modes of RuO2 using the rigid-ion model, which ruled out the possibility that this band originated from disorder induced symmetry, allowed silent mode. Based on the x-ray photoelectron spectroscopy (XPS) and temperature dependent Raman studies, this band was assigned to hydrated RuO2. XPS characterizations of our samples revealed minute surface contamination of oxygen and chlorine, probably due to the film preparation and high temperature deposition processes. Films with uniform microstructure, low surface roughness, and good electrical properties meet the requirements for serving as the bottom electrode for the ferroelectric capacitor. (C) 2001 American Institute of Physics.
引用
收藏
页码:2987 / 2992
页数:6
相关论文
共 45 条
[1]   INFLUENCE OF PLATINUM INTERLAYERS ON THE ELECTRICAL-PROPERTIES OF RUO2/PB(ZR0.53TI0.47)O-3/RUO2 CAPACITOR HETEROSTRUCTURES [J].
ALSHAREEF, HN ;
BELLUR, KR ;
KINGON, AI ;
AUCIELLO, O .
APPLIED PHYSICS LETTERS, 1995, 66 (02) :239-241
[2]  
Bhaskar S, 2000, MATER RES SOC SYMP P, V606, P211
[3]   High-pressure oxidation of ruthenium as probed by surface-enhanced Raman and X-ray photoelectron spectroscopies [J].
Chan, HYH ;
Takoudis, CC ;
Weaver, MJ .
JOURNAL OF CATALYSIS, 1997, 172 (02) :336-345
[4]  
Chastain J., 1992, HDB XRAY PHOTOELECTR, V40, P221
[5]  
CULLITY D, 1967, ELEMENTS XRAY DIFFRA, P261
[6]   RAMAN, TRANSMISSION ELECTRON-MICROSCOPY, AND CONDUCTIVITY MEASUREMENTS IN MOLECULAR-BEAM DEPOSITED MICROCRYSTALLINE SI AND GE - A COMPARATIVE-STUDY [J].
GONZALEZHERNANDEZ, J ;
AZARBAYEJANI, GH ;
TSU, R ;
POLLAK, FH .
APPLIED PHYSICS LETTERS, 1985, 47 (12) :1350-1352
[7]   CHEMICAL VAPOR-DEPOSITION OF RUTHENIUM AND RUTHENIUM DIOXIDE FILMS [J].
GREEN, ML ;
GROSS, ME ;
PAPA, LE ;
SCHNOES, KJ ;
BRASEN, D .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (11) :2677-2685
[8]   COMPOSITIONAL AND MICROSTRUCTURAL CHARACTERIZATION OF RUO2-TIO2 CATALYSTS SYNTHESIZED BY THE SOL-GEL METHOD [J].
GUGLIELMI, M ;
COLOMBO, P ;
RIGATO, V ;
BATTAGLIN, G ;
BOSCOLOBOSCOLETTO, A ;
DEBATTISTI, A .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (06) :1655-1661
[9]  
HAYNES W, 1978, SCATTERING LIGHT CRY
[10]   RAMAN INVESTIGATION OF RUTILE RUO2 [J].
HUANG, YS ;
POLLAK, FH .
SOLID STATE COMMUNICATIONS, 1982, 43 (12) :921-924