Compositional inhomogeneity of InGaN grown on sapphire and bulk GaN substrates by metalorganic chemical vapor deposition

被引：55

作者：

Sato, H ^{[1
]}

Sugahara, T ^{[1
]}

Naoi, Y ^{[1
]}

Sakai, S ^{[1
]}

机构：

[1] Univ Tokushima, Dept Elect & Elect Engn, Tokushima 7708506, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1998年 / 37卷 / 4A期

关键词：

InGaN; MOCVD; compositional inhomogeneity; CL; EDX;

D O I：

10.1143/JJAP.37.2013

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The compositional inhomogeneity of the InGaN layers in GaN/InGaN/GaN double-hetero (DH) and InGaN/GaN single-hetero (SH) structures grown by metalorganic chemical vapor deposition ((MOCVD) on sapphire (0001) and bulk GaN was investigated by means of cathodoluminescence (CL) and energy dispersive X-ray (EDX) spectroscopy. Dotlike CL image of the band edge emission from InGaN was observed. The bright spots were found to have higher indium content compared to that on the outside of the spots. The compositional inhomogeneity increased and the density of the spot decreased with increasing film thickness. Hexagonal hillocks, which had higher indium content and emitted stronger CL, were observed on the surface of the SH structure. Compositional inhomogeneity of homoepitaxial InGaN on bulk GaN substrate was much less compared to that of InGaN on sapphire revealing that dislocation plays a key role in producing an inhomogeneity. A possible mechanism that explains these phenomena is proposed.

引用

页码：2013 / 2015

页数：3

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