Electron velocity distribution functions in a sputtering magnetron discharge for the ExB direction

被引：37

作者：

Sheridan, TE ^{[1
]}

Goeckner, MJ ^{[1
]}

Goree, J ^{[1
]}

机构：

[1] Univ Iowa, Dept Phys & Astron, Iowa City, IA 52242 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 04期

关键词：

D O I：

10.1116/1.581325

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The electron velocity distribution function is measured for the E x B (azimuthal) direction in a cylindrically symmetric, planar, sputtering magnetron discharge as a function of height above the cathode. Near the cathode, the distribution function is approximately a warm Maxwellian (T-e approximate to 2 eV) shifted in the E x B direction, indicating a strong azimuthal drift. Farther above the cathode, the distribution function is characterized by a cold (T-e approximate to 0.5 eV), Maxwellian bulk with energetic, asymmetric tails. (C) 1998 American Vacuum Society. [S0734-2101(98)05304-4].

引用

页码：2173 / 2176

页数：4

共 13 条

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[13] CHARGED-PARTICLE FLUXES FROM PLANAR MAGNETRON SPUTTERING SOURCES [J].

WINDOW, B ;

SAVVIDES, N .

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