Growth of m-plane GaN quantum wires and quantum dots on m-plane 6H-SiC

被引:21
作者
Amstatt, B.
Renard, J.
Bougerol, C.
Bellet-Amalric, E.
Gayral, B.
Daudin, B.
机构
[1] Univ Grenoble 1, Inst Neel, CEA CNRS Grp Nanophys & Semicond, F-38042 Grenoble 9, France
[2] CEA Grenoble, Dept Rech Fondamentale Matiere Condensee, F-38054 Grenoble, France
[3] NOVASiC, F-73375 Le Bourget Du Lac, France
关键词
D O I
10.1063/1.2786050
中图分类号
O59 [应用物理学];
学科分类号
摘要
Growth of m-plane GaN quantum nanostructures on an AlN buffer layer on m-plane SiC is investigated. GaN nanostructures with different shapes are obtained depending on the AlN buffer layer thickness and the amount of GaN deposited. For AlN buffer layer below 300 nm, GaN quantum wires, elongated perpendicularly to the c axis, are obtained independently of the amount of GaN deposited. For buffer layer thickness above 300 nm, and for an amount of GaN below (above) 5 ML (monolayer), GaN quantum dots (wires) are obtained. The difference in m-plane GaN morphology is related to the buffer layer stress state and to the anisotropic surface diffusion of m-plane GaN. Optical properties suggest an absence of internal quantum confined Stark effect. (C) 2007 American Institute of Physics.
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页数:8
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