Metastability of two-hydrogen complexes in silicon

被引:11
作者
Chadi, DJ [1 ]
机构
[1] NEC Labs Amer, Princeton, NJ 08540 USA
关键词
D O I
10.1063/1.1624476
中图分类号
O59 [应用物理学];
学科分类号
摘要
A two-hydrogen interstitial complex (H-2(**)) in crystalline Si that exhibits metastability is proposed via first-principles total energy calculations. In its most stable state, H-2(**) is 0.28 eV/H higher in energy than H-2(*) and is electron-spin-resonance inactive. The complex has a metastable spin active state arising from a Si dangling-bond in which the H-H separation is 2.39 Angstrom. The properties of H-2(**) make it a promising candidate for the defect responsible for the Staebler-Wronski effect in amorphous Si. (C) 2003 American Institute of Physics.
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页码:3710 / 3712
页数:3
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