Pb/p-PbSe junction: An investigation of current-voltage and capacitance-voltage measurements

被引:13
作者
DosSantos, O
Mathet, V
Fau, C
Charar, S
Averous, M
机构
[1] GES-URA 357-UMII, F-34095, Montpellier Cedex 5, Pl. E. Bataillon
关键词
D O I
10.1016/0038-1101(95)00398-3
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Molecular beam epitaxy has been used to grow p-PbSe/CaF2/Si(111) heterostructures. Using such stuctures, which are fully compatible with standard photolithographic technological procedures, photovoltaic sensors have been realized. The I(V) characteristics of the Pb/p-PbSe contacts have been investigated experimentally and theoretically over a wide temperature range from 4 to 300 K. Evidence of the contribution of bulk and surface impurity concentrations in the space charge region at high temperature is presented. The Schottky barrier height has been derived from a fit to the experimental data. We used the theory of Padovani and Stratton in the context of Fermi-Dirac statistics. In addition the capacitance-voltage characteristics of Pb/p-PbSe diodes have been investigated. The Schottky barrier height has been obtained and the existence of an inversion layer at the surface of p-type PbSe layer has been demonstrated.
引用
收藏
页码:813 / 819
页数:7
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