Nanostructured polymers

被引：5

作者：

Huck, Wilhelm T. S. ^{[1
]}

机构：

[1] Univ Cambridge, Dept Chem, Cambridge CB2 1EW, England

来源：

INTERNATIONAL JOURNAL OF NANOTECHNOLOGY | 2004年 / 1卷 / 1-2期

关键词：

soft-lithography; self-assembly; block copolymers;

D O I：

10.1504/IJNT.2004.003722

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Polymers are ideal building blocks to fabricate organic nanostructures. To bridge the gap between natural and 'fabricated' devices more control over polymers at the nanometer level is required. This review will highlight a number of recent advances ill polymer synthesis, self-organization of block copolymers. and soft-lithographic techniques, that all provide new routes towards nanostructured polymers.

引用

页码：119 / 129

页数：11

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