Temperature-dependent leakage mechanisms of Pt/BiFeO3/SrRuO3 thin film capacitors

被引:184
作者
Yang, H. [1 ]
Jain, M. [1 ]
Suvorova, N. A. [1 ]
Zhou, H. [1 ]
Luo, H. M. [1 ]
Feldmann, D. M. [1 ]
Dowden, P. C. [1 ]
DePaula, R. F. [1 ]
Foltyn, S. R. [1 ]
Jia, Q. X. [1 ]
机构
[1] Los Alamos Natl Lab, Mat Phys & Applicat Div, Superconduct Technol Ctr, Los Alamos, NM 87545 USA
关键词
D O I
10.1063/1.2772666
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial c-axis oriented BiFeO3 (BFO) thin films were deposited on conductive SrRuO3 (SRO) on (001) SrTiO3 substrates by pulsed laser deposition. A Pt/BFO/SRO capacitor was constructed by depositing a top Pt electrode. The leakage current density versus. electric field characteristics were investigated from 80 to 350 K. It was found that the leakage mechanisms were a strong function of temperature and voltage polarity. At temperatures between 80 and 150 K, space-charge-limited current was the dominant leakage mechanism for both negative and positive biases. On the other hand, at temperatures between 200 and 350 K the dominant leakage mechanisms were Poole-Frenkle emission and Fowler-Nordheim tunneling for negative and positive biases, respectively. (C) 2007 American Institute of Physics.
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页数:3
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共 24 条
[1]   Change of conduction mechanism by microstructural variation in Pt/(Ba,Sr)TiO3/Pt film capacitors [J].
Ahn, KH ;
Kim, SS ;
Baik, S .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (01) :421-425
[2]  
BOER KW, 1990, SURVEY SEMICONDUCTOR, V7, P432
[3]   Leakage current characteristics of lead-zirconate-titanate thin film capacitors for memory device applications [J].
Chen, HM ;
Tsaur, SW ;
Lee, JYM .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (07) :4056-4060
[4]   Band gap and Schottky barrier heights of multiferroic BiFeO3 [J].
Clark, S. J. ;
Robertson, J. .
APPLIED PHYSICS LETTERS, 2007, 90 (13)
[5]   Physics of thin-film ferroelectric oxides [J].
Dawber, M ;
Rabe, KM ;
Scott, JF .
REVIEWS OF MODERN PHYSICS, 2005, 77 (04) :1083-1130
[6]   Large electric polarization and exchange bias in multiferroic BiFeO3 [J].
Dho, Joonghoe ;
Qi, Xiaoding ;
Kim, Hyunho ;
MacManus-Driscoll, Judith L. ;
Blamire, Mark G. .
ADVANCED MATERIALS, 2006, 18 (11) :1445-+
[7]   ELECTRODE INFLUENCE ON THE CHARGE-TRANSPORT THROUGH SRTIO3 THIN-FILMS [J].
DIETZ, GW ;
ANTPOHLER, W ;
KLEE, M ;
WASER, R .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (10) :6113-6121
[8]   Influence of strain and oxygen vacancies on the magnetoelectric properties of multiferroic bismuth ferrite [J].
Ederer, C ;
Spaldin, NA .
PHYSICAL REVIEW B, 2005, 71 (22)
[9]   Influence of La doping in multiferroic properties of BiFeO3 thin films -: art. no. 042903 [J].
Lee, YH ;
Wu, JM ;
Lai, CH .
APPLIED PHYSICS LETTERS, 2006, 88 (04) :1-3
[10]   ATOMIC STRUCTURE OF BIFEO3 [J].
MICHEL, C ;
MOREAU, JM ;
ACHENBAC.GD ;
GERSON, R ;
JAMES, WJ .
SOLID STATE COMMUNICATIONS, 1969, 7 (09) :701-&