Fabrication of alloys and superlattices based on ZnO towards ultraviolet laser

被引:122
作者
Ohtomo, A
Kawasaki, M
Sakurai, Y
Ohkubo, I
Shiroki, R
Yoshida, Y
Yasuda, T
Segawa, Y
Koinuma, H
机构
[1] Tokyo Inst Technol, Dept Innovat & Engineered Mat, Yokohama, Kanagawa 2268502, Japan
[2] Toyo Univ, Fac Engn, Kawagoe, Saitama 3508585, Japan
[3] Tokyo Inst Technol, Mat & Struct Lab, Yokohama, Kanagawa 2268503, Japan
[4] Inst Phys & Chem Res, Photodynam Res Ctr, Sendai, Miyagi 9800868, Japan
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1998年 / 56卷 / 2-3期
基金
日本学术振兴会;
关键词
ZnO; MgxZn1-xO alloy; ultraviolet laser; laser molecular beam epitaxy; superlattice;
D O I
10.1016/S0921-5107(98)00218-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have grown epitaxial MgxZn1-xO alloy films and ZnO/MgxZn1-xO (x = 0.20) superlattices on sapphire(0001) substrates by laser molecular beam epitaxy and characterized their structures by X-ray diffraction. Single phase MgxZn1-xO could be obtained up to x = 0.33, whereas MgO impurity phase with (111) orientation segregated at x > 0.33. The bandgap of MgxZn1-xO was successfully controlled as verified by the photoluminescence peaks shifting 3.36 eV (x = 0) to 3.87 eV (x = 0.33). It was found that the structure of the superlattices was greatly improved by the use of a ZnO buffer layer on sapphire substrate prior to the deposition of superlattice. Small angle X-ray diffraction peaks corresponding to the period of the superlattices ranging from 8 to 18 nm could be clearly observed. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:263 / 266
页数:4
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