Sculpting of three-dimensional nano-optical structures in silicon

被引：19

作者：

Koonath, P ^{[1
]}

Kishima, K ^{[1
]}

Indukuri, T ^{[1
]}

Jalali, B ^{[1
]}

机构：

[1] Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA

来源：

APPLIED PHYSICS LETTERS | 2003年 / 83卷 / 24期

关键词：

D O I：

10.1063/1.1634384

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Separation by IMplantation of OXygen (SIMOX) based process has been developed to sculpt three-dimensionally integrated nano-optical waveguiding structures in silicon. An approach, based on the implantation of oxygen ions into a silicon substrate, patterned with thermal oxide, has been adopted to synthesize low loss buried rib waveguides in a single implantation step of thickness 286 nm and widths varying from 2 mum to 12 mum. These waveguides show propagation losses in the range of 3-4 dB/cm. The capability of the process to sculpt three-dimensional (3-D) structures has also been demonstrated by defining rib waveguides on the top silicon layer. (C) 2003 American Institute of Physics.

引用

页码：4909 / 4911

页数：3

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