Cutoff frequency and propagation delay time of 1.5-nm gate oxide CMOS

被引:26
作者
Momose, HS [1 ]
Morifuji, E
Yoshitomi, T
Ohguro, T
Saito, M
Iwai, H
机构
[1] Toshiba Co Ltd, Yokohama, Kanagawa 2358522, Japan
[2] Tokyo Inst Technol, Yokohama, Kanagawa 2268502, Japan
关键词
CMOS; cutoff frequency; gate oxide; MOSFET; propagation delay time; scaling;
D O I
10.1109/16.925243
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The high-frequency AC characteristics of 1.5-nm direct-tunneling gate SiO2 CMOS are described. Very high cutoff frequencies of 170 GHz and 245 GHz were obtained for 0.08-mum and 0.06-mum gate length nMOSFETs at room temperature, Cutoff frequency of 65 GHz was obtained for 0.15-mum gate length pMOSFETs using 1.5-nm gate SiO2 for the first time. The normal oscillations of the 1.5-nm gate SiO2 CMOS ring oscillators were also confirmed. In addition, this paper investigates the cutoff frequency and propagation delay time in recent small-geometry CMOS and discusses the effect of gate oxide thinning. The importance of reducing the gate oxide thickness in the direct-tunneling regime is discussed for sub-0.1-mum gate length CMOS in terms of high-frequency, high-speed operation.
引用
收藏
页码:1165 / 1174
页数:10
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