The influence of neon in the deposition of titanium nitride by plasma-assisted physical vapour deposition

被引：8

作者：

Fancey, KS ^{[1
]}

Leyland, A ^{[1
]}

Badow, FM ^{[1
]}

Matthews, A ^{[1
]}

机构：

[1] Univ Hull, Sch Engn, Res Ctr Surface Engn, Hull HU6 7RX, N Humberside, England

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1999年 / 262卷 / 1-2期

关键词：

PVD; titanium nitride; neon; penning ionisation;

D O I：

10.1016/S0921-5093(98)01033-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Titanium nitride coatings were produced by reactive (plasma-assisted) deposition in argon and neon-based nitrogenous discharges. Coating analysis has indicated that during deposition, nitrogen reactivity can be enhanced when neon is used, and this may be attributed to Penning ionisation. The effect could assist deposition onto heat-sensitive materials by permitting lower processing temperatures. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：227 / 231

页数：5

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