High-performance carbon nanotube field-effect transistor with tunable Polarities

被引:356
作者
Lin, YM [1 ]
Appenzeller, J
Knoch, J
Avouris, P
机构
[1] IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
[2] Res Ctr Julich, Ctr Nanoelect Syst, Inst Thin Film & Interfaces, D-52454 Julich, Germany
关键词
carbon nanotube; doping; field-effect transistor; Schottky barrier (SB);
D O I
10.1109/TNANO.2005.851427
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
State-of-the-art carbon nanotube field-effect transistors (CNFETs) behave as Schottky-barrier-modulated transistors. It is known that vertical scaling of the gate oxide significantly improves the performance of these devices. However, decreasing the oxide thickness also results in pronounced ambipolar transistor characteristics and increased drain leakage currents. Using a novel device concept, we have fabricated high-performance enhancement-mode CNFETs exhibiting n- or p-type unipolar behavior, tunable by electrostatic and/or chemical doping, with excellent OFF-State performance and a steep subthreshold swing (S = 63 mV/dec). The device design allows for aggressive oxide thickness and gate-length scaling while maintaining the desired device characteristics.
引用
收藏
页码:481 / 489
页数:9
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