Growth conditions and morphology of GaN single crystals fabricated by the Na flux method

被引:12
作者
Aoki, M
Yamane, H
Shimada, M
Sarayama, S
Disalvo, FJ
机构
[1] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] Ricoh Co Ltd, Res & Dev Grp, R&D Ctr, Dept 5, Natori, Miyagi 9811241, Japan
[3] Cornell Univ, Dept Chem & Biol Chem, Ithaca, NY 14853 USA
关键词
GaN; single ctystal; growth condition; crystal morphology; Na flux;
D O I
10.2109/jcersj.109.1274_858
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Crystal growth of GaN was carried out by the Na flux method at 700-850 degreesC and 1-5 MPa of N-2 for 200 h. At higher temperatures and lower pressures, only Na-Ga intermetallic compounds are formed. At higher pressures or lower temperatures, the morphology of GaN single crystals depends on the experimental conditions. Hexagonal platelet crystals were obtained at lower temperature and higher N-2 pressure, and hexagonal prismatic crystals grew at higher temperature and lower N-2 pressure. Colorless transparent prismatic single crystals with a size of 1.0 x 0.5 x 0.5 mm(3) were synthesized by slowly increasing the growth temperature at a rate of 0.5 degreesC/h from 750 to 800 degreesC under 3 MPa of N-2.
引用
收藏
页码:858 / 862
页数:5
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