Composition control of barium strontium titanate thin films prepared by chemical vapor deposition

被引：14

作者：

Kiyotoshi, M ^{[1
]}

Eguchi, K ^{[1
]}

Imai, K ^{[1
]}

Arikado, T ^{[1
]}

机构：

[1] Toshiba Corp, Adv Microelect Ctr, Microelect Engn Lab, Isogo Ku, Yokohama, Kanagawa 2358522, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 08期

关键词：

barium strontium titanate; BST; chemical vapor deposition; composition; kinetically limited condition; composition matching;

D O I：

10.1143/JJAP.37.4487

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Composition control of barium strontium titanate thin films prepared by chemical vapor deposition using Ba(THD)(2), Sr(THD)(2), and Ti(THD)(2)(i-OC3H7)(2) (THD: 2,2,6,6-tetramethyl-3,5-heptanedionate) has been studied by investigating the effects of deposition temperature and the supply rates of metal sources. Although there were complicated correlations among the deposition rates of Ba, Sr, and Ti under kinetically limited conditions, the deposition rate ratio of Ba/Sr was linearly related to the partial pressure ratio of Ba(THD)(2)/Sr(THD)(2), and the ratio of Ti/(Ba + Sr) spontaneously approaches unity. In order to explain these characteristics, we proposed a model wherein the THD complex of Ba or Sr reacts with the THD complex of Ti and generates a dimer such as (THD)(2)Ba-O-Ti(THD)(2), and this dimer becomes the dominant precursor for chemical vapor deposition (CVD) under kinetically limited conditions.

引用

页码：4487 / 4492

页数：6

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