Ion-beam-induced reconstruction of amorphous GaN

被引:23
作者
Kucheyev, SO [1 ]
Williams, JS
Zou, J
Bradby, JE
Jagadish, C
Li, G
机构
[1] Australian Natl Univ, Res Sch Phys Sci & Engn, Dept Elect Mat Engn, Canberra, ACT 0200, Australia
[2] Univ Sydney, Electron Microscope Unit, Sydney, NSW 2006, Australia
[3] Univ Sydney, Australian Key Ctr Microscopy & Microanal, Sydney, NSW 2006, Australia
[4] Ledex Corp, Kaohsiung, Taiwan
来源
PHYSICAL REVIEW B | 2001年 / 63卷 / 11期
关键词
D O I
10.1103/PhysRevB.63.113202
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Wurtzite GaN can be rendered amorphous by high-dose heavy-ion bombardment. We show here that relatively low-dose reirradiation of such amorphous GaN (a-GaN) with MeV light ions can significantly change some of the physical properties of a-GaN. In particular, light-ion reirradiation of a-GaN results in (i) an increase in material density, (ii) the suppression of complete decomposition during postimplantation annealing, (iii) a significant increase in the values of hardness and Young's modulus, and (iv) an apparent decrease in the absorption of visible light. Transmission electronmicroscopy shows that a-GaN remains completely amorphous after light-ion reirradiation. Therefore, we attribute the above effects of light-ion reirradiation to an ion-beam-induced atomic-level reconstruction of the amorphous phase. Results indicate that electronic energy loss of light ions is responsible for the changes in the mechanical properties and for the suppression of thermally induced decomposition of a-GaN. However, the changes in the density of a-GaN appear to be controlled by the nuclear energy loss of light ions.
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共 13 条
[1]   A MONTE-CARLO COMPUTER-PROGRAM FOR THE TRANSPORT OF ENERGETIC IONS IN AMORPHOUS TARGETS [J].
BIERSACK, JP ;
HAGGMARK, LG .
NUCLEAR INSTRUMENTS & METHODS, 1980, 174 (1-2) :257-269
[2]   STOICHIOMETRIC DISTURBANCES IN ION-IMPLANTED COMPOUND SEMICONDUCTORS [J].
CHRISTEL, LA ;
GIBBONS, JF .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (08) :5050-5055
[3]   A SIMPLE PREDICTIVE MODEL FOR SPHERICAL INDENTATION [J].
FIELD, JS ;
SWAIN, MV .
JOURNAL OF MATERIALS RESEARCH, 1993, 8 (02) :297-306
[4]   In situ ion channeling study of gallium disorder and gold profiles in Au-implanted GaN [J].
Jiang, W ;
Weber, WJ ;
Thevuthasan, S .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (11) :7671-7678
[5]   Ion-beam-induced dissociation and bubble formation in GaN [J].
Kucheyev, SO ;
Williams, JS ;
Zou, J ;
Jagadish, C ;
Li, G .
APPLIED PHYSICS LETTERS, 2000, 77 (22) :3577-3579
[6]   Damage buildup in GaN under ion bombardment [J].
Kucheyev, SO ;
Williams, JS ;
Jagadish, C ;
Zou, J ;
Li, G .
PHYSICAL REVIEW B, 2000, 62 (11) :7510-7522
[7]   Ion-beam-induced porosity of GaN [J].
Kucheyev, SO ;
Williams, JS ;
Jagadish, C ;
Zou, J ;
Craig, VSJ ;
Li, G .
APPLIED PHYSICS LETTERS, 2000, 77 (10) :1455-1457
[8]   Strong surface disorder and loss of N produced by ion bombardment of GaN [J].
Kucheyev, SO ;
Williams, JS ;
Jagadish, C ;
Li, G ;
Pearton, SJ .
APPLIED PHYSICS LETTERS, 2000, 76 (26) :3899-3901
[9]   Deformation behavior of ion-beam-modified GaN [J].
Kucheyev, SO ;
Bradby, JE ;
Williams, JS ;
Jagadish, C ;
Swain, MV ;
Li, G .
APPLIED PHYSICS LETTERS, 2001, 78 (02) :156-158
[10]   Ion implantation in GaN at liquid-nitrogen temperature: Structural characteristics and amorphization [J].
Liu, C ;
Mensching, B ;
Zeitler, M ;
Volz, K ;
Rauschenbach, B .
PHYSICAL REVIEW B, 1998, 57 (04) :2530-2535