Dust particle diagnostics in RF plasma deposition of silicon and silicon oxide films (invited)

被引：23

作者：

Hollenstein, C ^{[1
]}

Howling, AA ^{[1
]}

Courteille, C ^{[1
]}

Dorier, JL ^{[1
]}

Sansonnens, L ^{[1
]}

Magni, D ^{[1
]}

Müller, H ^{[1
]}

机构：

[1] Ecole Polytech Fed Lausanne, Ctr Rech Phys Plasmas, PPB Ecublens, CH-1015 Lausanne, Switzerland

来源：

AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998 | 1998年 / 507卷

关键词：

D O I：

10.1557/PROC-507-547

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Particle contamination formed in reactive plasmas imposes an upper limit on the rate for particle-free deposition. Conversely, these plasmas could be exploited to produce nanometric clusters and particles for various applications. Infrared absorption spectroscopy has been applied to analyse the chemical composition of suspended particles. Mass spectrometry was also used to investigate cluster formation in these deposition plasmas. In pure silane plasmas, a random model reproduces the measured mass spectra, whereas the rich plasma chemistry in silane/oxygen mixtures shows a remarkable tendency to produce silasesquioxane anions.

引用

页码：547 / 557

页数：11

共 37 条

[31] THE ROLE OF METASTABLE ATOMS IN ARGON-DILUTED SILANE RADIOFREQUENCY PLASMAS [J].

SANSONNENS, L ;

HOWLING, AA ;

HOLLENSTEIN, C ;

DORIER, JL ;

KROLL, U .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1994, 27 (07) :1406-1411

[32] A voltage uniformity study in large-area reactors for RF plasma deposition [J].

Sansonnens, L ;

Pletzer, A ;

Magni, D ;

Howling, AA ;

Hollenstein, C ;

Schmitt, JPM .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1997, 6 (02) :170-178

[33] Optical characterization of particle traps [J].

Selwyn, Gary S. .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (03) :340-347

[34] Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition [J].

Tanenbaum, DM ;

Laracuente, AL ;

Gallagher, A .

APPLIED PHYSICS LETTERS, 1996, 68 (12) :1705-1707

[35] MECHANISM OF CLUSTER FORMATION IN A CLEAN SILANE DISCHARGE [J].

VEPREK, S ;

SCHOPPER, K ;

AMBACHER, O ;

RIEGER, W ;

VEPREKHEIJMAN, MGJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (07) :1935-1942

[36] Three types of stable structures of hydrogenated silicon clusters [J].

Watanabe, MO ;

Murakami, H ;

Miyazaki, T ;

Kanayama, T .

APPLIED PHYSICS LETTERS, 1997, 71 (09) :1207-1209

[37]

Watanabe Y, 1997, PLASMA PHYS CONTR F, V39, P59, DOI 10.1088/0741-3335/39/5A/007

← 1 2 3 4 →