Grain nucleation and texture analysis of electroless copper deposition on a palladium seed layer

被引:21
作者
Johnson, B [1 ]
Amster, R [1 ]
Vanasupa, L [1 ]
机构
[1] Calif Polytech State Univ San Luis Obispo, Dept Mat Engn, San Luis Obispo, CA 93407 USA
基金
美国国家科学基金会;
关键词
electroless copper; interconnects; texture;
D O I
10.1007/s11664-998-0120-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electroless copper grains were deposited on a Pd seed layer under varying bath conditions. The seed layer was determined to have a (Ill)texture using grazing incident x-ray (GM) diffraction. Multiple nucleation sites in the grain boundaries were imaged using a scanning tunneling microscope. Continual copper growth produced row-like structures. The texture of the electrolessly deposited copper (ED-Cu) grains were determined to be (111). No radial grain orientation for the Pd seed layer or the ED-Cu thin film was detected using GM diffraction. Atomic force microscope images indicated continual Cu nucleation throughout the deposition process. PdH was formed as a by-product of the electroless deposition process, and detected by x-ray diffraction.
引用
收藏
页码:923 / 927
页数:5
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