Characteristics of oxynitride prepared by liquid phase deposition

Using an aqueous solution of ammonia hydroxide aqua, hydrosilicofluoric acid, and boric acid, an oxynitride film can be deposited. The deposition rate and refractive index increase with the mole concentration of ammonia hydroxide aqua. However, the refractive index decreases as the mole concentration of ammonia hydroxide aqua becomes too high. The secondary ion mass spectrometry depth profiles show that the nitrogen and hydrogen concentrations accumulate at the SiON/Si interface. A deposition model is proposed, and the leakage current density as a function of mole concentration of ammonia hydroxide aqua was studied. (C) 2000 The Electrochemical Society. S0013-4651(99)11-02 1-8. All rights reserved.