Fabrication of microchannel arrays in borophosphosilicate glass

被引：9

作者：

Callender, CL ^{[1
]}

Ledderhof, CJ ^{[1
]}

Dumais, P ^{[1
]}

Blanchetière, C ^{[1
]}

Noad, JP ^{[1
]}

机构：

[1] Commun Res Ctr, Ottawa, ON K2H 8S2, Canada

来源：

JOURNAL OF MATERIALS RESEARCH | 2005年 / 20卷 / 03期

关键词：

D O I：

10.1557/JMR.2005.0102

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Two-dimensional arrays of embedded channels with cross-sectional diameters of 1-3 mu m were fabricated in silica-on-silicon thin film structures. The channel arrays were fabricated using void-forming borophosphosilcate glass (BPSG) deposited by plasma-enhanced chemical vapor deposition (PECVD) over templates patterned and etched using standard photolithographic methods and reactive ion etching. The size and shape of the channels could be controlled by adjusting the depth, width, and spacing of the template ridges, the dopant levels in the BPSG, and the annealing conditions. Optimization of the channel fabrication process through detailed investigation of the process variables is presented. Potential applications in photonics, sensors, and microfluidics are discussed.

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收藏

页码：759 / 764

页数：6

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共 20 条

[1] LOW-PRESSURE DEPOSITION OF DOPED SIO2 BY PYROLYSIS OF TETRAETHYLORTHOSILICATE (TEOS) .1. BORON AND PHOSPHORUS DOPED FILMS [J].

BECKER, FS ;

ROHL, S .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (11) :2923-2931

[2] Ultralow loss high delta silica germania planar waveguides [J].

Bellman, RA ;

Bourdon, G ;

Alibert, G ;

Beguin, A ;

Guiot, E ;

Simpson, LB ;

Lehuede, P ;

Guiziou, L ;

LeGuen, E .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004, 151 (08) :G541-G547

[3] Deposition of thick TEOS PECVD silicon oxide layers for integrated optical waveguide applications [J].

Bulla, DAP ;

Morimoto, NI .

THIN SOLID FILMS, 1998, 334 (1-2) :60-64

[4] Fabrication of 2-D and 3-D silicon photonic crystals by deep etching [J].

Chelnokov, A ;

David, S ;

Wang, K ;

Marty, F ;

Lourtioz, JM .

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2002, 8 (04) :919-927

[5] Microfabricated devices in biotechnology and biochemical processing [J].

Chován, T ;

Guttman, A .

TRENDS IN BIOTECHNOLOGY, 2002, 20 (03) :116-122

[6] Plasma enhanced CVD silicon oxide films for integrated optic applications [J].

Domínguez, C ;

Rodríguez, JA ;

Muñoz, FJ ;

Zine, N .

VACUUM, 1999, 52 (04) :395-400

[7] Silica-on-silicon optical sensor based on integrated waveguides and microchannels [J].

Dumais, P ;

Callender, CL ;

Noad, JP ;

Ledderhof, CJ .

IEEE PHOTONICS TECHNOLOGY LETTERS, 2005, 17 (02) :441-443

[8] Microfluid mechanics: progress and opportunities [J].

Giordano, N ;

Cheng, JT .

JOURNAL OF PHYSICS-CONDENSED MATTER, 2001, 13 (15) :R271-R295

[9] Electrical and physical characterization of tetraethylorthosilicate-O-3 borophosphosilicate glass [J].

Iyer, R ;

Thakur, RPS ;

Rhodes, H ;

Liao, R ;

Rosler, R ;

Yieh, E .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (10) :3366-3371

[10] Evolution of microchannel flow passages - Thermohydraulic performance and fabrication technology [J].

Kandlikar, SG ;

Grande, WJ .

HEAT TRANSFER ENGINEERING, 2003, 24 (01) :3-17