Electronic structure of Sn/Si(111)-(√3x√3)R30° as a function of Sn coverage -: art. no. 235332

被引:20
作者
Lobo, J
Tejeda, A
Mugarza, A
Michel, EG
机构
[1] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
[2] Univ Basque Country, Donostia Int Phys Ctr, San Sebastian, Spain
[3] Univ Basque Country, Ctr Mixto Mat CSIC UPV, San Sebastian, Spain
[4] Univ Autonoma Madrid, Inst Univ Ciencia Mat Nicolas Cabrera, E-28049 Madrid, Spain
关键词
D O I
10.1103/PhysRevB.68.235332
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report an investigation of the electronic band structure of the SixSn(1-x)/Si(111)-(root3xroot3)R30degrees solid solution using angle-resolved photoemission. This reconstruction was studied in the coverage range between 0.15 and 0.40 monolayers at room and low temperature, with special emphasis on the analysis of the symmetry and morphology of the surface states and the metallic character as a function of temperature and coverage. While there is no indication of a (3x3) pattern at low temperature with structural techniques, strikingly clear features of this phase are found in the valence band analysis for a coverage of 0.33 ML. We present also an analysis of the influence of the Si intermixing in the surface-state behavior and metallic character.
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页数:7
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