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Solution-Processed Dioctylbenzothienobenzothiophene-Based Top-Gate Organic Transistors with High Mobility, Low Threshold Voltage, and High Electrical Stability
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作者:

Endo, Toshiyuki
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Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan

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Kobayashi, Takashi
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Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan
Osaka Prefecture Univ, Res Inst Mol Elect Devices, Sakai, Osaka 5998531, Japan Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan

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Ikeda, Masaaki
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Nippon Kayaku Co Ltd, Funct Chem R&D Labs, Kita Ku, Tokyo 1158588, Japan
Kyushu Univ, Ctr Organ Photon & Elect Res, Fukuoka 8190395, Japan Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan

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机构:
[1] Osaka Prefecture Univ, Dept Phys & Elect, Sakai, Osaka 5998531, Japan
[2] Osaka Prefecture Univ, Res Inst Mol Elect Devices, Sakai, Osaka 5998531, Japan
[3] Hiroshima Univ, Fac Engn, Dept Appl Chem, Hiroshima 7398527, Japan
[4] Nippon Kayaku Co Ltd, Funct Chem R&D Labs, Kita Ku, Tokyo 1158588, Japan
[5] Kyushu Univ, Ctr Organ Photon & Elect Res, Fukuoka 8190395, Japan
关键词:
FIELD-EFFECT TRANSISTORS;
THIN-FILM TRANSISTORS;
HIGH-PERFORMANCE;
BIAS STRESS;
DIELECTRICS;
INSULATORS;
D O I:
10.1143/APEX.3.121601
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Dioctylbenzothieno[2,3-b]benzothiophene (C-8-BTBT)-based organic field-effect transistors (OFETs) with a top-gate configuration, having fluoropolymer gate insulators, are fabricated by means of a spin-coating technique. The device fabrication is simple, and it enables us to obtain C-8-BTBT FETs having high field-effect mobility (mu(FET)), low threshold voltage (V-th), and high electrical stability. We fabricate 116 top-gate C-8-BTBT FETs having mu(FET) of 1: 59 +/- 0: 40 cm(2) V-1 s(-1) and Vth of -1: 48 +/- 3: 02 V, and the maximum mu(FET) is approximately 3 cm(2) cm(2) V-1 s(-1). No changes in the devices characteristics are observed after applying a negative gate bias stress of -1: 2 MV/cm for 10(4) s. (C) 2010 The Japan Society of Applied Physics
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