共 25 条
[12]
HYBRID FILMS FORMED FROM HEXAMETHYLDISILOXANE AND SIO BY PLASMA PROCESS
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1991, 30 (08)
:1803-1807
[18]
CARBON CONTENT OF SILICON-OXIDE FILMS DEPOSITED BY ROOM-TEMPERATURE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF HEXAMETHYLDISILOXANE AND OXYGEN
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1994, 12 (04)
:1365-1370
[19]
Tielsch BJ, 1996, SURF INTERFACE ANAL, V24, P28, DOI 10.1002/(SICI)1096-9918(199601)24:1<28::AID-SIA66>3.0.CO
[20]
2-G