Incorporation of InAs nanostructures in a silicon matrix:: growth, structure and optical properties

被引:6
作者
Cirlin, GE
Polyakov, NK
Petrov, VN
Egorov, VA
Denisov, DV
Volovik, BV
Ustinov, VM
Alferov, ZI
Ledentsov, NN
Heitz, R
Bimberg, D
Zakharov, ND
Werner, P
Gösele, U
机构
[1] Russian Acad Sci, Inst Analyt Instrumentat, St Petersburg 198103, Russia
[2] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 196140, Russia
[3] Max Planck Inst Microstruct Phys, D-06120 Halle, Germany
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2001年 / 80卷 / 1-3期
基金
俄罗斯基础研究基金会;
关键词
molecular beam epitaxy; quantum dots; InAs; silicon; photoluminescence; transmission electron microscopy;
D O I
10.1016/S0921-5107(00)00624-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
MBE growth and properties of InAs nanoscale islands formed on silicon are reported. Islands capped with Si emit a photoluminescence band in the 1.3 mum region. Upon annealing at increased substrate temperature, extensive interdiffusion leads to the formation of an InAs solid solution in the Si cap layer. Additionally, InAs-enriched regions with extensions of similar to 6 nm, exhibiting two kinds of ordering, are observed. The ordering of InAs molecules occurs, respectively, in (101) and (10(1) over bar) planes inclined to (110) and (1(1) over bar 0) planes parallel to the [001] growth direction. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:108 / 111
页数:4
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