Atmospheric Pressure PECVD of Fluorocarbon Coatings from Glow Dielectric Barrier Discharges

被引:29
作者
Fanelli, Fiorenza [1 ]
Fracassi, Francesco [1 ]
d'Agostino, Riccardo [1 ]
机构
[1] Univ Bari, Dipartimento Chim, IMIP CNR, I-70126 Bari, Italy
关键词
atmospheric pressure glow discharges (APGD); coatings; deposition; films; fluorocarbon films; glow dielectric barrier discharges (GDBD);
D O I
10.1002/ppap.200731201
中图分类号
O59 [应用物理学];
学科分类号
摘要
The deposition of fluorocarbon films from GDBDs fed with helium-hexafluoropropene (He-C3F6) and helium-octafluoropropane-hydrogen (He-C3F8-H-2) mixtures was investigated. The effect of several parameters was evaluated in order to clarify both the GDBD existence domain and film characteristics. He-C3F6 GDBDs allowed to obtain films with an F/C ratio of 1.5 and to achieve deposition rates up to 35 nm . min (-1). By changing the H-2 content in He-C3F8-H-2 fed GDBDs it was possible to vary the crosslinking degree, to tune the F/C ratio of the coatings and to change the deposition rate which was maximized for an H-2/C3F8 ratio close to 1. A spectroscopic investigation of the plasma phase is also presented.
引用
收藏
页码:S430 / S434
页数:5
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