The interaction of the supersonic plasma-jet with the substrate in the RF plasma-chemical reactor

被引：11

作者：

Sicha, M

Hubicka, Z

Tichy, M

Novak, M

Soukup, L

Jastrabik, L

Behnke, JF

Kapicka, V

Kapoun, K

Sery, M

机构：

[1] ACAD SCI CZECH REPUBL,INST PHYS,DEPT OPT,PRAGUE 18040 8,CZECH REPUBLIC

[2] EMA UNIV,DEPT PHYS,D-17489 GREIFSWALD,GERMANY

[3] MASARYK UNIV,DEPT PHYS ELECT,FAC NAT SCI,BRNO 61137,CZECH REPUBLIC

[4] S BOHEMIAN UNIV,COLL EDUC,DEPT PHYS,CESKE BUDEJOVICE 37115,CZECH REPUBLIC

来源：

CONTRIBUTIONS TO PLASMA PHYSICS | 1996年 / 36卷 / 05期

关键词：

D O I：

10.1002/ctpp.2150360506

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Although the plasma-chemical processes and properties of the deposited thin film can strongly depend on the interaction of the supersonic plasma jet channel with the substrate, up to now the study of this phenomenon has not yet been done. We decided to study this interaction by means of CCD camera. The presented results indicate that the light intensity recorded close to the substrate can be used as a measure of the intensity of plasma-chemical deposition processes on the substrate surface.

引用

页码：605 / 611

页数：7

共 13 条

[1] NEUTRAL GAS-FLOW VELOCITY PROFILES IN THE JET PLASMA-CHEMICAL REACTOR [J].