In situ scanning tunneling microscopic study of polymerization of C60 clusters induced by electron injection from the probe tips

被引：36

作者：

Nakamura, Y ^{[1
]}

Mera, Y ^{[1
]}

Maeda, K ^{[1
]}

机构：

[1] Univ Tokyo, Grad Sch Engn, Dept Appl Phys, Bunkyo Ku, Tokyo 1136856, Japan

来源：

APPLIED PHYSICS LETTERS | 2000年 / 77卷 / 18期

关键词：

D O I：

10.1063/1.1320865

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Polymerization of C-60 clusters epitaxially grown on Si(111)-(7x7) substrates was found to be induced by electron injection from the probe tips of scanning tunneling microscopes (STM) as the sample bias was increased from +4.0 to +5.5 V, exhibiting an evolution behavior characterized by an incubation, a linear growth, and a saturation. The incubation time and the growth rate are dependent greatly on the sample site, which is explained by a model taking into account the pre-existing stress as the driving force of the polymerization and the internal stress built up as a consequence of polymerization producing a stress for backward reactions. (C) 2000 American Institute of Physics. [S0003-6951(00)01844-1].

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页码：2834 / 2836

页数：3

相关论文

共 13 条

[1] Nanometer scale patterning of C-60 multilayers using molecular manipulation [J].

Dunn, AW ;

Moriarty, P ;

Beton, PH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1997, 15 (03) :1478-1481

[2] ENHANCED COHESION OF PHOTO-OXYGENATED FULLERENE FILMS - A NEW OPPORTUNITY FOR LITHOGRAPHY [J].

HEBARD, AF ;

EOM, CB ;

FLEMING, RM ;

CHABAL, YJ ;

MULLER, AJ ;

GLARUM, SH ;

PIETSCH, GJ ;

HADDON, RC ;

MUJSCE, AM ;

PACZKOWSKI, MA ;

KOCHANSKI, GP .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1993, 57 (03) :299-303

[3] Ionization and fragmentation of C-60 via multiphoton-multiplasmon excitation [J].

Hunsche, S ;

Starczewski, T ;

lHuillier, A ;

Persson, A ;

Wahlstrom, CG ;

vandenHeuvell, BVL ;

Svanberg, S .

PHYSICAL REVIEW LETTERS, 1996, 77 (10) :1966-1969

[4] Electron-beam-induced fragmentation in ultrathin C60 films on Si(100)-2x1-H:: Mechanisms of cage destruction [J].

Hunt, MRC ;

Schmidt, J ;

Palmer, RE .

PHYSICAL REVIEW B, 1999, 60 (08) :5927-5937

[5] NEW PHASES OF C-60 SYNTHESIZED AT HIGH-PRESSURE [J].

IWASA, Y ;

ARIMA, T ;

FLEMING, RM ;

SIEGRIST, T ;

ZHOU, O ;

HADDON, RC ;

ROTHBERG, LJ ;

LYONS, KB ;

CARTER, HL ;

HEBARD, AF ;

TYCKO, R ;

DABBAGH, G ;

KRAJEWSKI, JJ ;

THOMAS, GA ;

YAGI, T .

SCIENCE, 1994, 264 (5165) :1570-1572

[6] A reproducible method to fabricate atomically sharp tips for scanning tunneling microscopy [J].

Nakamura, Y ;

Mera, Y ;

Maeda, K .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1999, 70 (08) :3373-3376

[7] Photoinduced products in a C60 monolayer on Si(111)(√3x√3)-Ag:: An STM study [J].

Nakayama, T ;

Onoe, J ;

Nakatsuji, K ;

Nakamura, J ;

Takeuchi, K ;

Aono, M .

SURFACE REVIEW AND LETTERS, 1999, 6 (06) :1073-1078

[8] POLYMERIZED FULLERITE STRUCTURES [J].

NUNEZREGUEIRO, M ;

MARQUES, L ;

HODEAU, JL ;

BETHOUX, O ;

PERROUX, M .

PHYSICAL REVIEW LETTERS, 1995, 74 (02) :278-281

[9] PHOTOINDUCED POLYMERIZATION OF SOLID C-60 FILMS [J].

RAO, AM ;

ZHOU, P ;

WANG, KA ;

HAGER, GT ;

HOLDEN, JM ;

WANG, Y ;

LEE, WT ;

BI, XX ;

EKLUND, PC ;

CORNETT, DS ;

DUNCAN, MA ;

AMSTER, IJ .

SCIENCE, 1993, 259 (5097) :955-957

[10] A Fullerene derivative as an electron beam resist for nanolithography [J].

Robinson, APG ;

Palmer, RE ;

Tada, T ;

Kanayama, T ;

Preece, JA .

APPLIED PHYSICS LETTERS, 1998, 72 (11) :1302-1304