STM-induced reversible switching of local conductivity in thin Al2O3 films -: art. no. 153407

被引:17
作者
Kurnosikov, O
de Nooij, FC
LeClair, P
Kohlhepp, JT
Koopmans, B
Swagten, HJM
de Jonge, WJM
机构
[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
[2] Eindhoven Univ Technol, COBRA Res Inst, NL-5600 MB Eindhoven, Netherlands
来源
PHYSICAL REVIEW B | 2001年 / 64卷 / 15期
关键词
D O I
10.1103/PhysRevB.64.153407
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The local electron transport properties of thin aluminum oxide layers used for magnetic tunnel junctions were studied in situ by scanning tunneling microscopy (STM) and spectroscopy under ultrahigh-vacuum conditions. The STM images of the oxide films reveal a granular structure, down to atomic resolution. A reversible switching of the conductive properties of grains, attributed to a charge redistribution, is observed during scanning. We demonstrate the possibility of intentionally switching a grain to the low-resistance state by exposing it to a high current density. We conjecture that the observed switching behavior may be considered as the precursor of an electric breakdown in tunnel junctions.
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页数:4
相关论文
共 16 条
[1]   Tunneling phenomena as a probe to investigate atomic scale fluctuations in metal/oxide/metal magnetic tunnel junctions [J].
Da Costa, V ;
Tiusan, C ;
Dimopoulos, T ;
Ounadjela, K .
PHYSICAL REVIEW LETTERS, 2000, 85 (04) :876-879
[2]   Electrical conduction and dielectric breakdown in aluminum oxide insulators on silicon [J].
Kolodzey, J ;
Chowdhury, EA ;
Adam, TN ;
Qui, GH ;
Rau, I ;
Olowolafe, JO ;
Suehle, JS ;
Chen, Y .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2000, 47 (01) :121-128
[3]  
KUK Y, 1992, SCANNING TUNNELING M, P17
[4]   Optical and in situ characterization of plasma oxidized Al for magnetic tunnel junctions [J].
LeClair, P ;
Kohlhepp, JT ;
Smits, AA ;
Swagten, HJM ;
Koopmans, B ;
de Jonge, WJM .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (09) :6070-6072
[5]   Apparent spin polarization decay in Cu-dusted Co/Al2O3/Co tunnel junctions [J].
LeClair, P ;
Swagten, HJM ;
Kohlhepp, JT ;
van de Veerdonk, RJM ;
de Jonge, WJM .
PHYSICAL REVIEW LETTERS, 2000, 84 (13) :2933-2936
[6]   Hot carrier transport effects in Al2O3-based metal-oxide-semiconductor structures [J].
Ludeke, R ;
Cuberes, MT ;
Cartier, E .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (04) :2153-2159
[7]   Dielectric breakdown of ultrathin aluminum oxide films induced by scanning tunneling microscopy [J].
Magtoto, NP ;
Niu, C ;
Ekstrom, BM ;
Addepalli, S ;
Kelber, JA .
APPLIED PHYSICS LETTERS, 2000, 77 (14) :2228-2230
[8]   Soft breakdown conduction in ultrathin (3-5 nm) gate dielectrics [J].
Miranda, E ;
Suñé, J ;
Rodríguez, R ;
Nafría, M ;
Aymerich, X ;
Fonseca, L ;
Campabadal, F .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2000, 47 (01) :82-89
[9]   Spin polarized tunneling in ferromagnetic junctions [J].
Moodera, JS ;
Mathon, G .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1999, 200 (1-3) :248-273
[10]   Dielectric breakdown of ferromagnetic tunnel junctions [J].
Oepts, W ;
Verhagen, HJ ;
de Jonge, WJM ;
Coehoorn, R .
APPLIED PHYSICS LETTERS, 1998, 73 (16) :2363-2365