Investigation of photoreaction mechanism of photosensitive glass by femtosecond laser

被引：77

作者：

Hongo, T

Sugioka, K

Niino, H

Cheng, Y

Masuda, M

Miyamoto, I

Takai, H

Midorikawa, K

机构：

[1] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan

[2] Tokyo Denki Univ, Dept Elect Engn, Grad Sch Engn, Chiyoda Ku, Tokyo 1018457, Japan

[3] Natl Inst Adv Ind Sci & Technol AIST, Tsukuba, Ibaraki 3058565, Japan

[4] Sci Univ Tokyo, Dept Appl Elect, Fac Ind Sci & Technol, Chiba 2788510, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 2005年 / 97卷 / 06期

关键词：

D O I：

10.1063/1.1856223

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A high-intensity femtosecond (fs) laser can fabricate complicated three-dimensional microstructures inside photosensitive glass with high spatial resolution. In this work, the mechanism of the photoreaction of the photosensitive glass to the infrared fs laser is investigated. We examine the photoinduced electron excitation process on the basis of the determination of the critical dose and a change of the optical-absorption spectrum after the fs laser irradiation. The photoreaction mechanism is discussed in comparison with the case of an ultraviolet nanosecond laser irradiation. Finally, the successive interband electron excitation through defect levels by multiphoton absorption is proposed. (C) 2005 American Institute of Physics.

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页数：4

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