Direct writing of patterned ceramics using electron-beam lithography and metallopolymer resists

被引:73
作者
Clendenning, SB
Aouba, S
Rayat, MS
Grozea, D
Sorge, JB
Brodersen, PM
Sodhi, RNS
Lu, ZH
Yip, CM
Freeman, MR
Ruda, HE [1 ]
Manners, I
机构
[1] Univ Toronto, Ctr Adv Nanotechnol, Toronto, ON M5S 3E4, Canada
[2] Univ Toronto, Dept Chem, Toronto, ON M5S 3H6, Canada
[3] Univ Toronto, Dept Mat Sci & Engn, Toronto, ON M5S 3E4, Canada
[4] Univ Toronto, Inst Biomat & Biomed Engn, Dept Chem Engn & Appl Chem, Toronto, ON M5S 3G9, Canada
[5] Univ Alberta, Dept Phys, Edmonton, AB T6G 2J1, Canada
[6] Univ Toronto, Dept Chem Engn & Appl Chem, Surface Interface Ontario, Toronto, ON M5S 3E5, Canada
关键词
D O I
10.1002/adma.200305740
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Patterned arrays of ceramics have been fabricated using electron-beam lithography (EBL) and a metallopolymer resist. Highly ordered arrays of dots, bars (see scanning electron microscopy and time-of-flight secondary ion mass spectrometry images in the Figure), and curved lines rich in Fe and Co are direct-written on films of a highly metallized cobalt-clusterized polyferrocenylsilane. Subsequent pyrolysis leads to ferromagnetic ceramics.
引用
收藏
页码:215 / +
页数:6
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