2W/mm output power density at 1 GHz for diamond FETs

被引:125
作者
Kasu, M [1 ]
Ueda, K [1 ]
Ye, H [1 ]
Yamauchi, Y [1 ]
Sasaki, S [1 ]
Makitnoto, T [1 ]
机构
[1] NTT Corp, NTT Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
关键词
D O I
10.1049/el:20053194
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Great improvement in the output power density of diamond FETs on a diamond homoepitaxial layer grown using a high-purity source gas is reported. For a device with a gate length of 0.1 mu m and gate width of 100 pro, at 1 GHz, maximum output power density of 2.1 W/mm, maximum power gain of 10.9 dB, and power added efficiency of 31.8% were obtained.
引用
收藏
页码:1249 / 1250
页数:2
相关论文
共 6 条
[1]   Diamond field effect transistors - concepts and challenges [J].
Aleksov, A ;
Kubovic, M ;
Kaeb, N ;
Spitzberg, U ;
Bergmaier, A ;
Dollinger, G ;
Bauer, T ;
Schreck, M ;
Stritzker, B ;
Kohn, E .
DIAMOND AND RELATED MATERIALS, 2003, 12 (3-7) :391-398
[2]   The toughest transistor yet [J].
Eastman, LF ;
Mishra, UK .
IEEE SPECTRUM, 2002, 39 (05) :28-+
[3]   High carrier mobility in single-crystal plasma-deposited diamond [J].
Isberg, J ;
Hammersberg, J ;
Johansson, E ;
Wikström, T ;
Twitchen, DJ ;
Whitehead, AJ ;
Coe, SE ;
Scarsbrook, GA .
SCIENCE, 2002, 297 (5587) :1670-1672
[4]   Influence of epitaxy on the surface conduction of diamond film [J].
Kasu, M ;
Kubovic, M ;
Aleksov, A ;
Teofilov, N ;
Taniyasu, Y ;
Sauer, R ;
Kohn, E ;
Makimoto, T ;
Kobayashi, N .
DIAMOND AND RELATED MATERIALS, 2004, 13 (02) :226-232
[5]  
Kohn E, 1998, SPR S MAT PROC, P331
[6]   Microwave performance evaluation of diamond surface channel FETs [J].
Kubovic, M ;
Kasu, M ;
Kallfass, I ;
Neuburger, M ;
Aleksov, A ;
Koley, G ;
Spencer, MG ;
Kohn, E .
DIAMOND AND RELATED MATERIALS, 2004, 13 (4-8) :802-807