Effect of pressure on exciton energies of homoepitaxial GaN

被引:21
作者
Liu, ZX
Korona, KP
Syassen, K
Kuhl, J
Pakula, K
Baranowski, JM
Grzegory, I
Porowski, S
机构
[1] Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany
[2] Univ Warsaw, Inst Expt Phys, PL-00681 Warsaw, Poland
[3] Polish Acad Sci, High Pressure Res Ctr, PL-01142 Warsaw, Poland
[4] Univ Warsaw, Inst Expt Phys, PL-00681 Warsaw, Poland
关键词
D O I
10.1016/S0038-1098(98)00381-0
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Optical reflectance spectra of a homoepitaxial gallium nitride layer were measured under high pressure (0-10 GPa) at low temperature (10 K). The layer was grown by metalorganic chemical vapor deposition on a GaN single crystal. The pressure dependencies of the A, B and C exciton resonance energies have been determined. A value of dE(g)/dP = 43.2(6) meV GPa(-1) is obtained for the linear pressure coefficient of the lowest band gap energy of GaN. Eased on changes of energy splittings between the A, B and C excitons, we conclude that the pressure dependence of the crystal field splitting parameter of GaN is very weak (0.4 meV GPa(-1)). This is indirect evidence that the atom coordination remains close to perfectly tetrahedral under hydrostatic pressure. (C) 1998 Elsevier Science Ltd. All rights reserved.
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收藏
页码:433 / 438
页数:6
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