Recent advances in magnetron sputtering

被引：144

作者：

Arnell, RD ^{[1
]}

Kelly, PJ ^{[1
]}

机构：

[1] Univ Salford, Ctr Adv Mat & Surface Engn, Salford M5 4WT, Lancs, England

来源：

SURFACE & COATINGS TECHNOLOGY | 1999年 / 112卷 / 1-3期

关键词：

magnetron sputtering; structure zone modelling; pulsed DC sputtering;

D O I：

10.1016/S0257-8972(98)00749-X

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The paper will outline the historical development of sputtering techniques up to the recent development of closed-field unbalanced magnetron sputtering (CFUBMS). Examples will then be given of the use of CFUBMS to develop advanced coatings for industrial applications, including corrosion resistant coatings for aerospace, hard ceramic coatings for wear resistance, and coatings with novel thermal and chemical properties. Finally, current development in the technology and in understanding of the principles of the process will be described. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：170 / 176

页数：7

共 22 条

[1] EFFECTS OF HIGH-FLUX LOW-ENERGY (20-100 EV) ION IRRADIATION DURING DEPOSITION ON THE MICROSTRUCTURE AND PREFERRED ORIENTATION OF TI0.5AL0.5N ALLOYS GROWN BY ULTRA-HIGH-VACUUM REACTIVE MAGNETRON SPUTTERING [J].

ADIBI, F ;

PETROV, I ;

GREENE, JE ;

HULTMAN, L ;

SUNDGREN, JE .

JOURNAL OF APPLIED PHYSICS, 1993, 73 (12) :8580-8589

[2] Aluminium-magnesium alloys as corrosion resistant coatings for steel [J].

Baldwin, KR ;

Bates, RI ;

Arnell, RD ;

Smith, CJE .

CORROSION SCIENCE, 1996, 38 (01) :155-170

[3] EFFECTS OF ARGON PRESSURE AND SUBSTRATE-TEMPERATURE ON THE STRUCTURE AND PROPERTIES OF SPUTTERED COPPER-FILMS [J].

CRAIG, S ;

HARDING, GL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (02) :205-215

[4] THE FORMATION AND CONTROL OF DIRECT-CURRENT MAGNETRON DISCHARGES FOR THE HIGH-RATE REACTIVE PROCESSING OF THIN-FILMS [J].

HOWSON, RP ;

SPENCER, AG ;

OKA, K ;

LEWIN, RW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :1230-1234

[5] MICROSTRUCTURE OF SPUTTERED METAL-FILMS GROWN IN HIGH-PRESSURE AND LOW-PRESSURE DISCHARGES [J].

KAY, E ;

PARMIGIANI, F ;

PARRISH, W .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06) :3074-3081

[6] The deposition of aluminium oxide coatings by reactive unbalanced magnetron sputtering [J].

Kelly, PJ ;

AbuZeid, OA ;

Arnell, RD ;

Tong, J .

SURFACE & COATINGS TECHNOLOGY, 1996, 86 (1-3) :28-32

[7] Development of a novel structure zone model relating to the closed-field unbalanced magnetron sputtering system [J].

Kelly, PJ ;

Arnell, RD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (05) :2858-2869

[8] REVISED STRUCTURE ZONE MODEL FOR THIN-FILM PHYSICAL STRUCTURE [J].

MESSIER, R ;

GIRI, AP ;

ROY, RA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :500-503

[9] DEPOSITION OF WEAR-RESISTANT COATINGS BASED ON DIAMOND-LIKE CARBON BY UNBALANCED MAGNETRON SPUTTERING [J].

MONAGHAN, DP ;

TEER, DG ;

LOGAN, PA ;

EFEOGLU, I ;

ARNELL, RD .

SURFACE & COATINGS TECHNOLOGY, 1993, 60 (1-3) :525-530

[10]

MONAGHAN DP, 1993, FINISHING NOV

← 1 2 3 →