MICROSTRUCTURE OF SPUTTERED METAL-FILMS GROWN IN HIGH-PRESSURE AND LOW-PRESSURE DISCHARGES

被引：47

作者：

KAY, E

PARMIGIANI, F

PARRISH, W

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.575477

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：3074 / 3081

页数：8

共 21 条

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[9] EFFECT OF ENERGETIC NEUTRALIZED NOBLE-GAS IONS ON THE STRUCTURE OF ION-BEAM SPUTTERED THIN METAL-FILMS [J].

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