PREFERENTIAL IONIZATION IN REACTIVE SPUTTERING DISCHARGES

被引：12

作者：

HECQ, M

HECQ, A

FONTIGNIES, M

机构：

来源：

THIN SOLID FILMS | 1984年 / 115卷 / 03期

关键词：

D O I：

10.1016/0040-6090(84)90186-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：L45 / L48

页数：4

共 13 条

[1]

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[4]

COBURN JW, 1974, J APPL PHYS, V45

[5] DIAGNOSTICS OF AN RF SPUTTERING GLOW DISCHARGE, CORRELATION BETWEEN ATOMIC-ABSORPTION AND MASS-SPECTROMETRY [J].

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COBURN, JW ;

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[6]

HECQ A, 1981, THESIS MONS U

[7] SOME EXPERIMENTAL ASPECTS OF DC REACTIVE SPUTTERING [J].

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HECQ, A ;

LIEMANS, M .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (12) :6176-6178

[8] A GLOW-DISCHARGE MASS-SPECTROMETRY STUDY OF REACTIVE SPUTTERING [J].

HECQ, M ;

HECQ, A .

THIN SOLID FILMS, 1981, 76 (01) :35-43

[9] REACTIONS OF SINGLY AND DOUBLY CHARGED ARGON IONS WITH N2 AND O2 IN A STEADY-STATE HOLLOW-CATHODE DISCHARGE [J].

HOWORKA, F .

JOURNAL OF CHEMICAL PHYSICS, 1978, 68 (03) :804-811

[10] MASS SPECTROMETRY OF IONS IN GLOW DISCHARGES .1. APPARATUS AND ITS APPLICATION TO POSITIVE COLUMN IN RARE GASES [J].

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