Synthesis of a subwavelength-pulse-width spatially modulated array illuminator for 0.633 mu m

被引：25

作者：

Miller, JM

deBeaucoudrey, N

Chavel, P

Cambril, E

Launois, H

机构：

[1] CNRS,MICROSTRUCT & MICROELECT LAB,F-92225 BAGNEUX,FRANCE

[2] MCGILL UNIV,DEPT ELECT ENGN,MONTREAL,PQ H3A 2A7,CANADA

来源：

OPTICS LETTERS | 1996年 / 21卷 / 17期

关键词：

D O I：

10.1364/OL.21.001399

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present the design, fabrication, and characterization of a subwavelength-pulse-width spatially modulated diffractive array illuminator for an operating wavelength of 0.633 mu m. Electromagnetic and scalar diffraction theories are used to reduce manufacturing difficulties while yielding high diffraction efficiency coupled with low reconstruction error. We employ direct electron beam writing and reactive ion etching to realize a transmission-type three-beam array illuminator in photoresist. (C) 1996 Optical Society of America

引用

页码：1399 / 1401

页数：3

共 17 条

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