Identification and thermal stability of the native oxides on InGaAs using synchrotron radiation based photoemission

被引:77
作者
Brennan, B. [1 ]
Hughes, G.
机构
[1] Dublin City Univ, Sch Phys Sci, Dublin 9, Ireland
基金
爱尔兰科学基金会;
关键词
RAY-PHOTOELECTRON-SPECTROSCOPY; EPIREADY GAAS(100) SURFACE; (NH4)(2)S-X SOLUTION; GAAS ELECTRODES; XPS; CHEMISTRY; LAYERS; INTERFACES; INAS;
D O I
10.1063/1.3475499
中图分类号
O59 [应用物理学];
学科分类号
摘要
A high resolution synchrotron radiation core level photoemission study of the native oxides on In(0.53)G(0.47)As was carried out in order to determine the various oxidation states present on the surface. The thermal stability of the oxidation states was also investigated by annealing the samples in vacuum at temperatures ranging from 150 to 450 degrees C. As well as the widely reported oxidation states, various arsenic, gallium, and indium oxides, along with mixed phase gallium arsenic and indium gallium oxides are identified. Elemental binary oxides have been identified as residing at the oxide substrate interface and could play an important role in understanding the growth of metal oxide dielectric layers on the In GaAs surface, due to their apparent chemical stability. (C) 2010 American Institute of Physics. [doi:10.1063/1.3475499]
引用
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页数:8
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