Templated self-assembly of block copolymers: Effect of substrate topography

被引：196

作者：

Cheng, JY

Ross, CA

Thomas, EL

Smith, HI

Vancso, GJ

机构：

[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

[2] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA

[3] Univ Twente, Dept Mat Sci & Technol, Polymers MESA Res Inst, NL-7500 AE Enschede, Netherlands

来源：

ADVANCED MATERIALS | 2003年 / 15卷 / 19期

关键词：

D O I：

10.1002/adma.200305244

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Topographical confinement is used to template the formation of nanoscale domains in a self-assembled block copolymer film. The topographical template controls the row spacings and feature-dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover).

引用

页码：1599 / +

页数：5

共 40 条

[1] Nanofabrication of integrated magnetoelectronic devices using patterned self-assembled copolymer templates
Bal, M
Ursache, A
Tuominen, MT
Goldbach, JT
Russell, TP
[J]. APPLIED PHYSICS LETTERS, 2002, 81 (18) : 3479 - 3481
[2] BLOCK COPOLYMER THERMODYNAMICS - THEORY AND EXPERIMENT
BATES, FS
FREDRICKSON, GH
[J]. ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1990, 41 (01) : 525 - 557
[3] Magnetic properties of large-area particle arrays fabricated using block copolymer lithography
Cheng, JY
Ross, CA
Thomas, EL
Smith, HI
Lammertink, RGH
Vancso, GJ
[J]. IEEE TRANSACTIONS ON MAGNETICS, 2002, 38 (05) : 2541 - 2543
[4] Fabrication of nanostructures with long-range order using block copolymer lithography
Cheng, JY
Ross, CA
Thomas, EL
Smith, HI
Vancso, GJ
[J]. APPLIED PHYSICS LETTERS, 2002, 81 (19) : 3657 - 3659
[5] Cheng JY, 2001, ADV MATER, V13, P1174, DOI 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO
[6] 2-Q
[7] Rapid prototyping of patterned functional nanostructures
Fan, HY
Lu, YF
Stump, A
Reed, ST
Baer, T
Schunk, R
Perez-Luna, V
López, GP
Brinker, CJ
[J]. NATURE, 2000, 405 (6782) : 56 - 60
[8] Lithography with a mask of block copolymer microstructures
Harrison, C
Park, M
Chaikin, PM
Register, RA
Adamson, DH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (02): : 544 - 552
[9] CONFINED BLOCK-COPOLYMER THIN-FILMS
KONERIPALLI, N
SINGH, N
LEVICKY, R
BATES, FS
GALLAGHER, PD
SATIJA, SK
[J]. MACROMOLECULES, 1995, 28 (08) : 2897 - 2904
[10] Fabrication of regularly arranged nanocolumns on diamond(100) using micellar masks
Koslowski, B
Strobel, S
Herzog, T
Heinz, B
Boyen, HG
Notz, R
Ziemann, P
Spatz, JP
Möller, M
[J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (10) : 7533 - 7538

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