Differential conductance fluctuations in silicon nanowire transistors caused by quasiballistic transport and scattering induced intersubband transitions
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作者:
Jin, Seonghoon
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Univ Massachusetts, Dept Elect & Comp Engn, Amherst, MA 01003 USAUniv Massachusetts, Dept Elect & Comp Engn, Amherst, MA 01003 USA
Jin, Seonghoon
[1
]
Fischetti, Massimo V.
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Univ Massachusetts, Dept Elect & Comp Engn, Amherst, MA 01003 USAUniv Massachusetts, Dept Elect & Comp Engn, Amherst, MA 01003 USA
Fischetti, Massimo V.
[1
]
Tang, Ting-Wei
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Univ Massachusetts, Dept Elect & Comp Engn, Amherst, MA 01003 USAUniv Massachusetts, Dept Elect & Comp Engn, Amherst, MA 01003 USA
Tang, Ting-Wei
[1
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机构:
[1] Univ Massachusetts, Dept Elect & Comp Engn, Amherst, MA 01003 USA
Calculations based on the multisubband Boltzmann transport equation with relevant microscopic scattering mechanisms predict abrupt differential conductance fluctuations (kinks) in the drain current versus drain voltage curves of silicon nanowire transistors at room temperature. The kink originates from the change of series resistance at the drain extension related to the interplay between quasiballistic transport and intersubband transitions of electrons caused by elastic interactions with acoustic phonons, surface roughness, and ionized impurities. The kink occurs when the energy of the second subband in the drain extension is aligned with the peak of the net electron flux distribution in the first subband. This bias condition yields a large series resistance in the drain extension because those quasiballistic electrons in the first subband which reach the drain can scatter isotropically into the second subband. (C) 2008 American Institute of Physics.