Elementary scattering theory of the Si MOSFET

被引:466
作者
Lundstrom, M
机构
[1] Dept. of Elec. and Comp. Engineering, Purdue University, West Lafayette
关键词
D O I
10.1109/55.596937
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A simple one-flux scattering theory of the silicon MOSFET is introduced, Current-voltage (I-V) characteristics are expressed in terms of scattering parameters rather than a mobility, For long-channel transistors, the results reduce to conventional drift-diffusion theory, but they also apply to devices in which the channel length is comparable to or even shorter than the mean-free-path, The results indicate that for very short channels the transconductance is limited by carrier injection from the source, The theory also indicates that evaluation of the drain current in short-channel MOSFET's is a near-equilibrium transport problem, even though the channel electric field is large in magnitude and varies rapidly in space.
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页码:361 / 363
页数:3
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