Fabrication of microstructures by wet etching of anodic aluminum oxide substrates

被引：40

作者：

Jee, SE

Lee, PS

Yoon, BJ

Jeong, SH

Lee, KH ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol, Dept Chem Engn, Div Elect & Comp Engn, Pohang 790784, Kyungbuk, South Korea

[2] Kyungpook Natl Univ, Dept Chem Engn, Taegu 702701, South Korea

来源：

CHEMISTRY OF MATERIALS | 2005年 / 17卷 / 16期

关键词：

D O I：

10.1021/cm0486565

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Anodic aluminum oxide (AAO) was used as substrates of microstructure fabrication. Complex structures with high aspect ratios were obtained by the single-step wet etching of the AAO substrates. Structures with different shapes and aspect ratios could be simultaneously obtained with vertical sidewalls. The surface morphology of the fabricated structures could be tailored. It is expected that various MEMS/NEMS devices can be built using this technique.

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页码：4049 / 4052

页数：4

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