Soft UV-nanoimprint lithography on non-planar surfaces

被引：26

作者：

Farshchian, Bahador ^{[1
,2
]}

Amirsadeghi, Alborz ^{[1
,2
]}

Hurst, Steven M. ^{[1
,2
]}

Wu, Jiahao ^{[1
,2
]}

Lee, Jaejong ^{[3
]}

Park, Sunggook ^{[1
,2
]}

机构：

[1] Louisiana State Univ, Dept Mech Engn, Baton Rouge, LA 70803 USA

[2] Louisiana State Univ, Ctr Biomodular Multiscale Syst CBM2, Baton Rouge, LA 70803 USA

[3] Korea Inst Machinery & Mat, Nanomech Syst Res Div, Taejon 305343, South Korea

来源：

MICROELECTRONIC ENGINEERING | 2011年 / 88卷 / 11期

基金：

美国国家科学基金会;

关键词：

Nanofabrication; Non-planar surfaces; UV-NIL; Thin PDMS stamp; PMMA; SUBMICRON PATTERNS; FABRICATION; MOLD; MECHANISM; PRESSURE; ARRAYS;

D O I：

10.1016/j.mee.2011.07.010

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

080906 [电磁信息功能材料与结构]; 082806 [农业信息与电气工程];

摘要：

We report on a simple and effective process that allows direct UV-imprinting of micro- and nanostructures on non-planar surfaces, even at sharp edges such as step surfaces. The key for the process is the use of a thin flexible polymer stamp, which was fabricated by spin-coating poly(dimethylsiloxane) (PDMS) on a pre-patterned Si or poly(methyl methacrylate) (PMMA) master and releasing the thin PDMS layer after curing. The thin PDMS stamp was used to conformally mold a UV resist layer coated on various non-planar substrates with different radii of curvature. With this method, we have successfully demonstrated micro- and nanopatterns down to 63 nm on curved surfaces as well as sharp step-like structures. The process so developed will improve the versatility and applicability of molding technologies in many applications that require patterning non-planar substrates, considering that most molding technologies allow for patterning only on planar substrates or surfaces with large curvature radii. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：3287 / 3292

页数：6

共 30 条

[1]

Direct imprinting using soft mold and gas pressure for large area and curved surfaces [J].