Improved mold fabrication for the definition of high quality nanopatterns by soft UV-nanoimprint lithography using diluted PDMS material

被引：85

作者：

Koo, Namil ^{[1
]}

Bender, Markus ^{[1
]}

Plachetka, Ulrich ^{[1
]}

Fuchs, Andreas ^{[1
]}

Wahlbrink, Thorsten ^{[1
]}

Bolten, Jens ^{[1
]}

Kurz, Heinrich ^{[1
]}

机构：

[1] Adv Microelect Ctr Aachen, AMO GmbH, D-52074 Aachen, Germany

来源：

MICROELECTRONIC ENGINEERING | 2007年 / 84卷 / 5-8期

关键词：

soft UV-nanoimprint; high resolution; flexible molds; PDMS mold fabrication; wafer scale imprint; UV-curable resist;

D O I：

10.1016/j.mee.2007.01.017

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An improved mold fabrication process that utilizes toluene diluted polydimethylsiloxane (PDMS) as flexible mold material was developed. Various toluene concentrations and their implication on the pattern definition using the Soft U-V-Nanoimprint process were analyzed and discussed. Dots with a resolution of 50 nm are well replicated and an excellent imprint homogeneity across a 4 in. wafer with one imprint step only is demonstrated. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：904 / 908

页数：5

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