Fabrication of a gray-tone mask and pattern transfer in thick photoresists

被引：26

作者：

Nicolas, S ^{[1
]}

Dufour-Gergam, E ^{[1
]}

Bosseboeuf, A ^{[1
]}

Bourouina, T ^{[1
]}

Gilles, JP ^{[1
]}

Grandchamp, JP ^{[1
]}

机构：

[1] Univ Paris 11, Inst Elect Fondamentale, F-91405 Orsay, France

来源：

JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 1998年 / 8卷 / 02期

关键词：

D O I：

10.1088/0960-1317/8/2/013

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A low-cost gray-tone mask fabrication for thick resist UV lithography is described. The experimental relation between the theoretical transmission and the remaining resist thickness after development is presented.

引用

页码：95 / 98

页数：4

共 12 条

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