Application of amorphous oxide TFT to electrophoretic display

被引:74
作者
Ito, M. [1 ]
Miyazaki, C. [1 ]
Ishizaki, M. [1 ]
Kon, M. [1 ]
Ikeda, N. [1 ]
Okubo, T. [1 ]
Matsubara, R. [1 ]
Hatta, K. [1 ]
Ugajin, Y. [1 ]
Sekine, N. [1 ]
机构
[1] Toppan Printing Co Ltd, Tech Res Inst, Saitama 3458508, Japan
关键词
thin film transistors;
D O I
10.1016/j.jnoncrysol.2007.10.083
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Application of amorphous oxide thin film transistor (TFT) to electronic paper is demonstrated. We have fabricated a 4-in. bottom gate amorphous In-Ga-Zn-O (a-IGZO) TFT array and combined it with an electrophoretic frontplane. The resolution of the display is 200 ppi and the number of the pixel is 640 x 480 (QVGA). As far as we know, this is the largest pixel count display which has been driven by oxide based TFTs. Moreover, we propose a low-cost fabrication process for oxide based TFT. A printing process was employed to form the source and drain electrodes. The source and electrodes were printed by a standard screen-printing method. A fine pattern for the source and drain electrodes with a channel length of 40 gm was successfully printed onto the a-IGZO semiconductor layer. Our a-IGZO TFT with printed source and drain electrodes shows high on/off ratio of more than seven orders of magnitude and field effect mobility of 2.8 cm(2)/V s. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:2777 / 2782
页数:6
相关论文
共 55 条
[51]   Room temperature pulsed laser deposited indium gallium zinc oxide channel based transparent thin film transistors [J].
Suresh, Arun ;
Wellenius, Patrick ;
Dhawan, Anuj ;
Muth, John .
APPLIED PHYSICS LETTERS, 2007, 90 (12)
[52]   High-performance transparent inorganic-organic hybrid thin-film n-type transistors [J].
Wang, Lian ;
Yoon, Myung-Han ;
Lu, Gang ;
Yang, Yu ;
Facchetti, Antonio ;
Marks, Tobin J. .
NATURE MATERIALS, 2006, 5 (11) :893-900
[53]   Room temperature deposited indium zinc oxide thin film transistors [J].
Wang, Yu-Lin ;
Ren, F. ;
Lim, Wantae ;
Norton, D. P. ;
Pearton, S. J. ;
Kravchenko, I. I. ;
Zavada, J. M. .
APPLIED PHYSICS LETTERS, 2007, 90 (23)
[54]   High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering [J].
Yabuta, Hisato ;
Sano, Masafumi ;
Abe, Katsumi ;
Aiba, Toshiaki ;
Den, Tohru ;
Kumomi, Hideya ;
Nomura, Kenji ;
Kamiya, Toshio ;
Hosono, Hideo .
APPLIED PHYSICS LETTERS, 2006, 89 (11)
[55]   High-mobility amorphous In2O3-10 wt %ZnO thin film transistors [J].
Yaglioglu, B. ;
Yeom, H. Y. ;
Beresford, R. ;
Paine, D. C. .
APPLIED PHYSICS LETTERS, 2006, 89 (06)