X-ray induced mask contamination and particulate monitoring in x-ray steppers

被引：10

作者：

Capasso, C ^{[1
]}

Pomerene, A ^{[1
]}

Chu, W ^{[1
]}

Leavey, J ^{[1
]}

Lamberti, A ^{[1
]}

Hector, S ^{[1
]}

Oberschmidt, J ^{[1
]}

Pol, V ^{[1
]}

机构：

[1] IBM CORP,SRDC,FISHKILL,NY 12524

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 06期

关键词：

D O I：

10.1116/1.589048

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The belief that proximity x-ray lithography is insensitive to contamination has been based on the assumption that contaminants are small hydrocarbon compounds. However, we will show that x rays may induce photoassisted processes that deposit saltlike films on the mask surface. We will also provide an explanation for the film geometry in the early stages of its growth and suggest some possible solutions to the issue. (C) 1996 American Vacuum Society.

引用

页码：4336 / 4340

页数：5

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