In view of the appreciable semiconducting gap of 0.26 eV observed in recent experiments, epitaxial graphene on a SiC substrate seems a promising channel material for FETs. Indeed, it is 2-D-and therefore does not require prohibitive lithography-and exhibits a wider gap than other alternative options, such as bilayer graphene. Here, we propose a model and assess the achievable performance of a nanoscale FET based on epitaxial graphene on SiC, conducting an exploration of the design parameter space. We show that the current can be modulated by four orders of magnitude; for digital applications, an I(on)/I(off) ratio of 50 and a subthreshold slope of 145 mV/dec can be obtained with a supply voltage of 0.25 V. This represents a significant progress toward solid-state integration of graphene electronics, but not yet sufficient for digital applications.
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
;
Novoselov, K. S.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
IBM Corp, TJ Watson Res Ctr, Armonk, NY 10504 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Kedzierski, Jakub
;
Hsu, Pei-Lan
论文数: 0引用数: 0
h-index: 0
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Hsu, Pei-Lan
;
Healey, Paul
论文数: 0引用数: 0
h-index: 0
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Healey, Paul
;
Wyatt, Peter W.
论文数: 0引用数: 0
h-index: 0
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Wyatt, Peter W.
;
Keast, Craig L.
论文数: 0引用数: 0
h-index: 0
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Keast, Craig L.
;
Sprinkle, Mike
论文数: 0引用数: 0
h-index: 0
机构:
Sch Phys Georgia Tech, Atlanta, GA 30332 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Sprinkle, Mike
;
Berger, Claire
论文数: 0引用数: 0
h-index: 0
机构:
CNRS, Inst Neel, F-38042 Grenoble, France
Georgia Inst Technol, Atlanta, GA 30332 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Berger, Claire
;
de Heer, Walt A.
论文数: 0引用数: 0
h-index: 0
机构:
Sch Phys Georgia Tech, Atlanta, GA 30332 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
机构:
Seoul Natl Univ, Dept Phys & Astron, Seoul 151747, South KoreaKonkuk Univ, Dept Phys, Seoul 143701, South Korea
Kim, Seungchul
;
Ihm, Jisoon
论文数: 0引用数: 0
h-index: 0
机构:
Seoul Natl Univ, Dept Phys & Astron, Seoul 151747, South KoreaKonkuk Univ, Dept Phys, Seoul 143701, South Korea
Ihm, Jisoon
;
论文数: 引用数:
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机构:
Choi, Hyoung Joon
;
Son, Young-Woo
论文数: 0引用数: 0
h-index: 0
机构:
Konkuk Univ, Dept Phys, Seoul 143701, South Korea
Yonsei Univ, Dept Phys, Seoul 120749, South KoreaKonkuk Univ, Dept Phys, Seoul 143701, South Korea
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
Geim, A. K.
;
Novoselov, K. S.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, EnglandUniv Manchester, Manchester Ctr Mesosci & Nanotechnol, Manchester M13 9PL, Lancs, England
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
IBM Corp, TJ Watson Res Ctr, Armonk, NY 10504 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Kedzierski, Jakub
;
Hsu, Pei-Lan
论文数: 0引用数: 0
h-index: 0
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Hsu, Pei-Lan
;
Healey, Paul
论文数: 0引用数: 0
h-index: 0
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Healey, Paul
;
Wyatt, Peter W.
论文数: 0引用数: 0
h-index: 0
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Wyatt, Peter W.
;
Keast, Craig L.
论文数: 0引用数: 0
h-index: 0
机构:
MIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Keast, Craig L.
;
Sprinkle, Mike
论文数: 0引用数: 0
h-index: 0
机构:
Sch Phys Georgia Tech, Atlanta, GA 30332 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Sprinkle, Mike
;
Berger, Claire
论文数: 0引用数: 0
h-index: 0
机构:
CNRS, Inst Neel, F-38042 Grenoble, France
Georgia Inst Technol, Atlanta, GA 30332 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
Berger, Claire
;
de Heer, Walt A.
论文数: 0引用数: 0
h-index: 0
机构:
Sch Phys Georgia Tech, Atlanta, GA 30332 USAMIT, Lincoln Lab, Adv Silicon Technol Grp, Lexington, MA 02420 USA
机构:
Seoul Natl Univ, Dept Phys & Astron, Seoul 151747, South KoreaKonkuk Univ, Dept Phys, Seoul 143701, South Korea
Kim, Seungchul
;
Ihm, Jisoon
论文数: 0引用数: 0
h-index: 0
机构:
Seoul Natl Univ, Dept Phys & Astron, Seoul 151747, South KoreaKonkuk Univ, Dept Phys, Seoul 143701, South Korea
Ihm, Jisoon
;
论文数: 引用数:
h-index:
机构:
Choi, Hyoung Joon
;
Son, Young-Woo
论文数: 0引用数: 0
h-index: 0
机构:
Konkuk Univ, Dept Phys, Seoul 143701, South Korea
Yonsei Univ, Dept Phys, Seoul 120749, South KoreaKonkuk Univ, Dept Phys, Seoul 143701, South Korea