Design and properties of phototransistor photodetector in standard 0.35-μm SiGeBiCMOS technology

被引:10
作者
Lai, Kuang-Sheng [1 ]
Huang, Ji-Chen [1 ]
Hsu, Klaus Ya. [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Elect Engn, Inst Elect Engn, Hsinchu 30013, Taiwan
关键词
photodetector; phototransistor; responsivity; SiGe;
D O I
10.1109/TED.2007.915385
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, without altering any step of the commercial 0.35-mu m SiGe BiCMOS process, a novel photodetector named phototransistor photodetector (PTPD) has been realized and demonstrated. The PTPD shows high photoresponsivity and its structure relaxes the tradeoff between sensitivity and speed. Responsivities of 9.5 A/W for 670 nm light and of 5.2 A/W for 850 nm light were achieved. The operation details of the PTPD are introduced in this paper. The device can be readily integrated with other on-chip circuits to form a high-performance optoelectronic IC. The low cost, the high performance, and the flexibility in optical-electrical design allow the SiGe PTPD to be used in many demanding applications.
引用
收藏
页码:774 / 781
页数:8
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